Table 1 Deposition parameters for synthesizing typical types of mono-layer diamond films
From: Approach for Polishing Diamond Coated Complicated Cutting Tool: Abrasive Flow Machining (AFM)
| Â | Nucleation | UMCD | UFGD | BDMCD | BDFGD |
|---|---|---|---|---|---|
Flux of H2 QH (mL/min) | Â | Â | 1100 | Â | Â |
Flux of acetone QAce (mL/min) | Â | Â | 20 | Â | Â |
B/C atomic ratio AR (ppm) | 0 | 0 | 0 | 4500 | 4500 |
Pressure p (Pa) | 1600 | 4000 | 1300 | 4000 | 1300 |
Filament diameter Df (mm) | Â | Â | 0.6 | Â | Â |
Filament length lf (mm) | Â | Â | 150 | Â | Â |
Filament separation sf (mm) | Â | Â | 36 | Â | Â |
Filament height hf (mm) |  |  | −6 |  |  |
Filament temperature Ts (°C) |  |  | 2100 ± 100 |  |  |
Substrate temperature Ts (°C) |  |  | 850 ± 50 |  |  |
Growth duration tg (h) | 0.5 | 12 | 9 | 11 | 8 |