Figure 4From: Formation Mechanism of Precursor Films at High Temperatures: A ReviewAppearance of representative sessile drop samples and cross-sectional view of Al-Si/Ti6Al4V system after isothermal wetting at 650 °C: (a) sessile drop samples, (b) top view of PF, (c) details of rectangle in (b), and (d) cross-sectional viewBack to article page